Refereed Publications

  1. "Automated Analysis of Orientational Order in Images of Fibrillar Materials", Nils Persson, Michael McBride, Martha Grover, and Elsa Reichmanis, Chemistry of Materials, 2016; DOI: 10.1021/acs.chemmater.6b01825
  2. "Conjugated Polymer Alignment: Synergisms Derived from Microfluidic Shear Design and UV Irradiation", Gang Wang, Ping-Hsun Chu, Boyi Fu, Zhongyuan He, Nabil Kleinhenz, Zhibo Yuan, Yimin Mao, Hongzhi Wang, and Elsa Reichmanis, ACS Applied Materials & Interfaces, 2016; DOI: 10.1021/acsami.6b07548
  3. "Toward Uniformly Dispersed Battery Electrode Composite Materials: Characteristic and Performance", Yo Han Kwon, Matthew M. Huie, Dalsu Choi, Mincheol Chang, Amy C. Marschilok, Kenneth J. Takeuchi, and Elsa Reichmanis, ACS Appl. Mater. Interfaces, (2016); DOI: 10.1021/acsami.5b11938.
  4. "Ordering of Poly(3-hexylthiophene) in Solutions and Films: Effects of Fiber Length and Grain Boundaries on Anisotropy and Mobility", Nabil Kleinhenz, Nils Persson, Zongzhe Xue, Ping-Hsun Chu, Gang Wang, Zhibo Yuan, Michael A. McBride, Dalsu Choi, Martha A. Grover, and Elsa Reichmanis, Chemistry of Materials, (2016); DOI:10.1021/acs.chemmater.6b01163
  5. "Elastomer-Polymer Semiconductor Blends for High-Performance Stretchable Charge Transport Networks", Dalsu Choi, Hyungchul Kim, Nils Persson, Ping-Hsun Chu, Mincheol Chang, Ji-Hwan Kang, Samuel Graham, and Elsa Reichmanis, Chemistry of Materials, (2016); DOI: 10.1021/acs.chemmater.5b04804
  6. "Flexible OFETS: Synergistic Effect of Regioregular and Regiorandom Poly(3-hexylthiophene) Blends for High Performance Flexible Organic Field Effect Transistors", Ping-Hsun Chu, Gang Wang, Boyi Fu, Dalsu Choi, Jung Ok Park, Mohan Srinivasarao, and Elsa Reichmanis, Advanced Electronic Materials, (2016); DOI: 10.1002/aelm.201670010
  7. "Best Practices for Reporting Organic Field Effect Transistor Device Performance", Dalsu Choi, Ping-Hsun Chu, Michael McBride, and Elsa Reichmanis (Associate Editor), Chemistry of Materials, (2015); DOI: 10.1021/acs.chemmater.5b01982
  8. "Protein-Assisted Assembly of pi-Conjugated Polymers", Cornelia Rosu, Nabil Kleinhenz, Dalsu Choi, Christopher J. Tassone, Xujun Zhang, Jung Ok Park, Mohan Srinivasarao, Paul S. Russo, and Elsa Reichmanis, Chemistry of Materials, (2015); DOI: 10.1021/acs.chemmater.5b04192
  9. "Microfluidic Crystal Engineering of pi-Conjugated Polymers", Gang Wang, Nils Persson, Ping-Hsun Chu, Nabil Kleinhenz, Boyi Fu, Mincheol Chang, Nabankur Deb, Yimin Mao, Hongzhi Wang, Martha A. Grover, and Elsa Reichmanis, ACS Nano, (2015); DOI: 10.1021/acsnano.5b02582
  10. "Photoinduced Anisotropic Assembly of Conjugated Polymers in Insulating Polymer Blends", Mincheol Chang, Dalsu Choi, Gang Wang, Nabil Kleinhenz, Nils Persson, Byoungnam Park, and Elsa Reichmanis, ACS Applied Materials and Interfaces, (2015); DOI: 10.1021/acsami.5b03310
  11. "Probing film solidification dynamics in polymer photovoltaics", Jeff L. Hernandez, Elsa Reichmanis, John R. Reynolds, Organic Electronics, (2015); DOI: 10.1016/j.orgel.2015.05.025
  12. "Molecular Engineering of Nonhalogenated Solution-Processable Bithiazole-Based Electron-Transport Polymeric Semiconductors", Boyi Fu, Cheng-Yin Wang, Bradley D. Rose, Yundi Jiang, Mincheol Chang, Ping-Hsun Chu, Zhibo Yuan, Canek Fuentes-Hernandez, Bernard Kippelen, Jean-Luc Bredas, David M. Collard, and Elsa Reichmanis, Chemistry of Materials, (2015); DOI: 10.1021/acs.chemmater.5b00173
  13. "Enhanced Mobility and Effective Control of Threshold Voltage in P3HT-Based Field-Effect Transistors via Inclusion of Oligothiophenes", Ping-Hsun Chu, Lei Zhang, Nicholas S. Colella, Boyi Fu, Jung Ok Park, Mohan Srinivasarao, Alejandro L. Briseno, and Elsa Reichmanis, ACS Applied Materials and Interfaces, (2015); DOI: 10.1021/am509090j
  14. "Liquid Crystalline Poly(3-hexylthiophene) Solutions Revisited: Role of Time-Dependent Self-Assembly", Nabil Kleinhenz, Cornelia Rosu, Sourav Chatterjee, Mincheol Chang, Karthik Nayani, Zongzhe Xue, Eugenia Kim, Jamilah Middlebrooks, Paul S. Russo, Jung Ok Park, Mohan Srinivasarao, and Elsa Reichmanis, Chemistry of Materials, (2015); DOI: 10.1021/acs.chemmater.5b00635
  15. "Controlled Assembly of Poly(3-hexylthiophene): Managing the Disorder to Order Transition on the Nano- through Meso-Scales", Dalsu Choi, Mincheol Chang, and Elsa Reichmanis, Advanced Functional Materials, (2014); DOI: 10.1002/adfm.201403708
  16. "Anisotropic Assembly of Conjugated Polymer Nanocrystallites for Enhanced Charge Transport", Mincheol Chang, Jiho Lee, Ping-Hsun Chu, Dalsu Choi, Byoungnam Park, and Elsa Reichmanis, ACS Applied Materials and Interfaces, (2014); DOI: 10.1021/am506546k
  17. "Competition between Charge Transport and Energy Barrier in Injection-Limited Metal/Quantum Dot Nanocrystal Contacts", Youngjun Kim, Seongeun Cho, Sunho Jeong, Doo-Hyun Ko, Hyungduk Ko, Namho You, Mincheol Chang, Elsa Reichmanis, Jun-Young Park, Sung Young Park, Jong Suk Lee, Heesun Yang, Insik In, and Byoungnam Park, Chemistry of Materials, (2014); DOI: 10.1021/cm502763z
  18. "Additive-Free Hollow-Structured Co3O4 Nanoparticle Li-Ion Battery: The Origins of Irreversible Capacity Loss", Youngjun Kim, Jung-Hyun Lee, Sungeun Cho, Yongwoo Kwon, Insik In, Jihoon Lee, Nam-Ho You, Elsa Reichmanis, Hyungduk Ko, Kyu-Tae Lee, Hyun-Keun Kwon, Doo-Hyun Ko, Heesun Yang, and Byoungnam Park, ACS Nano, (2014); DOI: 10.1021/nn500218m
  19. "Photoinduced Anisotropic Supramolecular Assembly and Enhanced Charge Transport of Poly(3-hexylthiophene) Thin Films", Mincheol Chang, Jiho Lee, Nabil Kleinhenz, Boyi Fu, Elsa Reichmanis, Advanced Functional Materials, (2014); DOI: 10.1002/adfm.201400523
  20. "Enhancing Field-Effect Mobility of Conjugated Polymers Through Rational Design of Branched Side Chains", Boyi Fu, Jose Baltazar, Ashwin Ravi-Sankar, Ping-Hsun Chu, Siyuan Zhang, David M. Collard, Elsa Reichmanis, Advanced Functional Materials, (2014); DOI: 10.1002/adfm.201304231
  21. "Photopolymer Materials and Processes for Advanced Technologies", James V. Crivello and Elsa Reichmanis, Chemistry of Materials, 26(1), pp533-548 (2014); DOI: 10.1021/cm402262g
  22. "Simultaneous Study of Exciton Diffusion/Dissociation and Charge Transport in a Donor-Acceptor Bilayer: Pentacene on a C60-terminated Self-Assembled Monolayer", Byoungnam Park, Seong Eun Cho, Younjun Kim, Wonjin Lee, Nam-Ho You, Insik In, Elsa Reichmanis, Advanced Materials, 25(44), pp6453-6458 (2013); DOI: 10.1002/adma.201302934
  23. "Solvent Based Hydrogen Bonding : Impact on Poly(3-hexylthiophene) Nanoscale Morphology and Charge Transport Characteristics", Mincheol Chang, Dalsu Choi, Boyi Fu, Elsa Reichmanis, ACS Nano, 7(6), pp5402-5413 (2013); DOI: 10.1021/nn401323f
  24. "Ultrasound-Induced Ordering in Poly(3-hexylthiophene): Role of Molecular and Process Parameters on Morphology and Charge Transport", Avishek Aiyar, Jung-Il Hong, Jessica Izumi, Dalsu Choi, Nabil Kleinhenz, Elsa Reichmanis, ACS Applied Materials and Interface, 5(7), pp2368-2377 (2013); DOI: 10.1021/am3027822
  25. "Creating and Optimizing Interfaces for Electric-Field and Photon-Induced Charge Transfer", Byoungnam Park, Kevin Whitham, Jiung Cho, and Elsa Reichmanis, ACS Nano, 6(11), pp9466-9474 (2012); DOI: 10.1021/nn302175f
  26. "Low-Threshold Photon Upconversion Capsules Obtained by Photoinduced Interfacial Polymerization". Ji-Hwan Kang, Elsa Reichmanis, Angewandte Chemie, 124(47), pp12011-12014 (2012); DOI: 10.1002/ange.201205540
  27. "Regioregularity and Intrachain Ordering: Impact on the Nanostructure and Charge Transport in Two-Dimensional Assemblies of Poly(3-hexylthiophene)", A. Aiyar, J.-I. Hong, E. Reichmanis, Chemistry of Materials, 24(15), pp2845?2853 (2012); DOI: 10.1021/cm202700k
  28. "High Charge Carrier Mobility, Low Band Gap Donor-Acceptor Benzothiadiazole-oligothiophene Based Polymeric Semiconductors", Boyi Fu, Jose Baltazar, Zhaokang Hu, An-Ting Chien, Satish Kumar, Clifford L. Henderson, David M. Collard, and Elsa Reichmanis, Chemistry of Materials, 24(21), pp4123?4133 (2012); DOI: 10.1021/cm3021929
  29. "Imparting Chemical Stability in Nanoparticulate Silver via a Conjugated Polymer Casing Approach" Mincheol Chang, Taejoon Kim, Hyun-Woo Park, Minjeong Kang, Elsa Reichmanis and Hyeonseok Yoon, ACS Applied Materials and Interface, 4(8), pp4357-4365 (2012); DOI: 10.1021/am3009967
  30. "An Approach to Core-Shell Nanostructured Materials with High Colloidal and Chemical Stability: Synthesis, Characterization and Mechanistic Evaluation", M. Chang, and E. Reichmanis, Journal of Colloid and Polymer Science, (2012); DOI: 10.1007/s00396-012-2731-x
  31. "Exciton Dissociation and Charge Transport Properties at a Modified Donor/Acceptor Interface: P3HT/thiol-ZnO Bulk Hetero-junction Interfaces", B. Park, J-H. Lee, M. Chang and E. Reichmanis, Journal of Physical Chemistry, C, 116(6), 4252-4258 (2012); DOI: 10.1021/jp208932v
  32. "Exciton Dissociation and Charge Trapping at P3HT/PCBM Bulk Heterojunction Interfaces: Photo-induced Threshold Voltage Shifts in Organic Field-effect Transistors and Solar Cells", Byoungnam Park and Elsa Reichmanis, Journal of Applied Physics, 111(8), 084908 (2012); DOI: 10.1063/1.4705277
  33. "Memory and Photovoltaic Elements in Organic Field-Effect Transistors with Acceptor/Donor Planar-hetero Junction Interfaces", B. Park, S. Choi, S. Graham, and E. Reichmanis, Journal of Physical Chemistry, C, 116(17), 9390-9397 (2012); DOI: 10.1021/jp300708z
  34. "Synthesis and Characterization of Graft Polymethacrylates Containing Conducting Diphenyldithiophene for Organic Thin Film Transistors", Z. Hu, B. Fu, A. R. Aiyar, E. Reichmanis, J. Poly Sci Poly Chem Ed, (2012); DOI: 10.1002/pola.24957
  35. "Change in Electronic States in the Accumulation Layer at Interfaces in a Poly(3-hexylthiophene) Field Effect Transistor and the Impact of Encapsulation", B. Park, Y. J. Kim, S. Graham, E. Reichmanis, ACS Applied Materials and Interfaces, 3(9), 3545-3551 (2011).
  36. B. Park, A. Aiyar, M.-S. Park, M. Srinivasarao, E. Reichmanis, "Conducting Channel Formation in Poly(3-hexylthiophene) Field Effect Transistors: Bulk to Interface", Journal of Physical Chemistry, C, 115(23), 11719-11726 (2011).
  37. "Electrical Contact Properties between the Accumulation layer and Metal Electrodes in Ultrathin Poly(3-hexylthiophene)(P3HT) Field Effect Transistors", B. Park, A. Aiyar, J.-I. Hong, E. Reichmanis, ACS Applied Materials and Interfaces, 3(5), 1574-1580 (2011).
  38. "Solvent Evaporation Induced Liquid Crystalline Phase in Poly(3-hexyl thiophene)", M. S. Park, A. Aiyar, J. O.; Park, E. Reichmanis, M. Srinivasarao, Journal of the American Chemical Society, 133(19), 7244-7247 (2011).
  39. "Tunable Crystallinity in Regioregular Poly(3-Hexylthiophene) Thin Films and its Impact on Field Effect Mobility", A. R. Aiyar, J.-I. Hong, R. Nambiar, D. M. Collard, E. Reichmanis, Advanced Functional Materials, 21(14), 2652-2659 (2011).
  40. "Solution Processable π-Conjugated Oligothiophene Grafted Polystyrene: Synthesis and Properties Characterization", Zhaokang Hu, Elsa Reichmanis, Journal of Polymer Science, Polymer Chemistry Edition, 49(5), 1155-1162 (2011).
  41. "Research in Macromolecular Science: Challenges and Opportunities for the Next Decade", C. K. Ober, S. Z. D. Cheng, P. T. Hammond, M. Muthukumar, E. Reichmanis, K. L. Wooley, T. P. Lodge, Macromolecules, 42(2), 465-471 (2009).
  42. " Ring Oscillator Fabricated Completely by Means of Mass-printing Technologies", A.C. Huebler, F. Doetz, H. Kempa, H. E. Katz, M. Bartzsch, N. Brandt, I Hennig, U. Fuegmann, S. Vaiyanathan, J. Granstrom, S. Liu, A. Sydorenko, T. Zilliger, G. Schmidt, K. Preissler, E. Reichmanis, P. Eckerle, F. Richter, T. Fischer, U. Hahn, Org Electronics, 8, 480-486 (2007).
  43. "Investigation of Solubility - Field effect Mobility Orthogonality in Substituted Phenylene-Thiophene Co-oligomers", V. Vaidyanathan, F. Doetz, H. E. Katz, R. Lawrentz, J. Granstrom, E. Reichmanis, Chem Mater, 19, 4676-4681 (2007).
  44. "Plastic Electronic Devices: From Materials Design to Device Applications" E. Reichmanis, H. E. Katz, C. Kloc, A. J. Maliakal, Bell Labs Technical Journal, 10(3), 87 (2005).
  45. "Testing the Limits for Resists", E. Reichmanis and O. Nalamasu, Science, 297, 349 (2002).
  46. "Nanoporous Ultralow Dielectric Constant Organosilicates Templated By Triblock Copolymers", S. Yang, P. Mirau, C-S. Pai, O. Nalamasu, E. Reichmanis, J-C. Pai, Y. S. Obeng, J. Seputro, E. Lin, H-J. Lee, J. Sun, and D. Gidley, Chem. Mater, 14, 369 (2002).
  47. "Processing and Characterization Ultra Low Dielectric Constant Organosilicates", S. Yang. J. C. Pai, C.-S. Pai, G. Dabbagh, O. Nalamasu, E. Reichmanis, J. Seputro, and Y. S. Obeng, J. Vac. Sci. Tech. B 19(6), 2155 (2001).
  48. "Polymers, Photoresponsive (in Electronic Applications)", E. Reichmanis, O. Nalamasu, F. M. Houlihan, Encyclopedia of Physical Science and Technology, Third Ed. (12), 723 (2001).
  49. "Molecular Templating of Nanoporous Ultra Low-Dielectric Constant (~1.5) Organosilicates by Tailing the Microphase Separation of Triblock Copolymers", S. Yang, P. A. Mirau, C. Pai, O. Nalamasu, E. Reichmanis, E. Lin, H-J. Lee, D. Gidley, J. Sun, Chemistry of Materials, 13(9), 2762 (2001).
  50. "Study of Base Additives for Use in a Single Layer 193 nm Resist Based Upon Poly(norbornene/maleic anhydride/acrylic acid/tert-butyl Acrylate) ", F. M. Houlihan, D. Person, I. Rushkin, O. Dimov, E. Reichmanis, O. Nalamasu, J. Photopolym. Sci. and Technol., 14(3), 373-384 (2001).
  51. "Polymer Materials for Microelectronics Imaging Applications", E. Reichmanis, O. Nalamasu, In Applied Polymer Science, C. D. Craver, C. E. Carraher, Eds., Elsevier, Oxford, 2000, pp. 635-658.
  52. "Fundamental Studies of Dissolution Inhibitors in Poly(Norbornene-alt-Maleic Anhydride) Based Resins", F. M. Houlihan, G. Dabbagh, I. L. Rushkin, R. S. Hutton, D. Osei, J. Sousa, K. Bolan, O. Nalamasu, E. Reichmanis, J. Photopolym. Sci. & Technol., 13(4), 569 (2000).
  53. "Fundamental Studies of Molecular Interactions and Dissolution Inhibition in Poly(norbornene-alt-maleic anhydride)-Based Resins", F. M. Houlihan, G. Dabbagh, I. Rushkin, R. S. Hutton, D. Osei, J. Sousa, K. Bolan, O. Nalamasu, E. Reichmanis, Chem. Mater., 12, 3516 (2000).
  54. "Microlithographic Applications of Organosilicon Polymers", In Silicon-Containing Polymers: The Science and Technology of their Synthesis and Applications, E. Reichmanis, A. E. Novembre, O. Nalamasu, G. Dabbagh, Chapman & Hall, Ltd., Kluwer Academic Publishers, Netherlands, 2000, pp. 743-762.
  55. "Radiation Chemistry of Polymeric Materials: Novel Chemistry and Applications for Microlithography", E. Reichmanis, O. Nalamasu, F. M. Houlihan, A. E. Novembre, Polymer International, 48, 1053 (1999).
  56. "Fundamental Studies of the Effects of Photo-Additive Structure in Resist Outgassing", F. M. Houlihan, I. L. Rushkin, R. S. Hutton, A. G. Timko, E. Reichmanis, O. Nalamasu, A. H. Gabor, A. N. Medina, S. Malik, M. Neisser, R. R. Kunz, D. K. Downs, J. Photopolym. Sci. & Technol., 12, 525 (1999).
  57. "Advances in Resist Materials for 193 nm Lithography", M. J. Bowden, A. H. Gabor, O. Dimov, T. Steephausler, J. J. Biafore, G. Spaziano, S. G. Slater, A. J. Blakeney, M. O. Nessier, F. M. Houlihan, R. A. Cirelli, G. Dabbagh, R. S. Hutton, I. L. Rushkin, J. R. Sweeney, A. G. Timko, O. Nalamasu, E. Reichmanis, J. Photopolym. Sci. & Technol., 12, 423 (1999).
  58. "Single Layer Resist Design for 193 nm Lithography", O. Nalamasu, F. M. Houlihan, R. A. Cirelli, G. P. Watson, E. Reichmanis, Solid State Technology, 42(5), 29 (1999).
  59. "Organic Materials Challenges for 193 nm Imaging", E. Reichmanis, O. Nalamasu, F. M. Houlihan, Accounts of Chemical Research, 32(8), 659 (1999).
  60. "Capabilities and Limitations of Plasma Polymerized Methylsilane (PPMS) All-Dry Lithography", G. Dabbagh, R. S. Hutton, R. A. Cirelli, A. E. Novembre, E. Reichmanis,O. Nalamasu, J. Photopholymer Sci. Tech., 11, 651 (1998).
  61. "Photogenerators of Sulfamic Acids: Use in Chemically Amplified Single Layer Resists", F. M. Houlihan, J. M. Kometani, A. G. Timko, R. S. Hutton, R. A. Cirelli, E. Reichmanis, O. Nalamasu, A. H. Gabor, A. N. Medina, J. J. Biafore, S. G. Slater, J. Photopolymer Sci. Tech., 11, 419 (1998).
  62. "193 nm Single Layer Resist Strategies, Concepts and Recent Results", O. Nalamasu, F. M. Houlihan, R. A. Cirelli, A. G. Timko, G. P. Watson, R. S. Hutton, J. M. Kometani, E. Reichmanis, J. Vac. Sci. Tech. 16(6), 3716-3721 (1998).
  63. "193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties", F. M. Houlihan, A. G. Timko, R. S. Hutton, R. A. Cirelli, J. M. Kometani, E. Reichmanis, O. Nalamasu, ACS Symposium Series, 706, Ito, H., Reichmanis, E., Nalamasu, O., Ueno, T., Eds., ACS, Washington, DC, 1998, pp. 191.
  64. "Design Concepts for Solution Developed 193 nm Lithographic Materials", E. Reichmanis, O. Nalamasu, T. I. Wallow, F. M. Houlihan, A. E. Novembre, Future Fab., 1 (2), 159, (1997).
  65. "A Retrospective on 2-Nitrobenzyl Sulfonate Photoacid Generators", F. M. Houlihan, O. Nalamasu, J. M. Kometani, E. Reichmanis, J. Imaging Sci. & Technol., 41 (1), 35 (1997).
  66. "Polymers in Electronics", E. Reichmanis, T. X. Neenan, in "Chemistry of Advanced Materials: An Overview", L. V. Interrante, M. Hampden-Smith, Eds, John Wiley and Sons, Inc. New York, 1997, pp. 99-141.
  67. "A Commercially Viable 193 nm Single-Layer Resist Platform", F. M. Houlihan, T. I. Wallow. A. G. Timko, E. Neria, R. S. Hutton, R. A. Cirelli, J. M. Kometani, O. Nalamasu, E. Reichmanis, J. Photopolymer Sci. & Technol., 10 (13), 511, (1997).
  68. "Resist Design Concepts for 193 nm Lithographic Opportunities for Innovation and Invention", E. Reichmanis, O. Nalamasu, F. M. Houlihan, T. I. Wallow, A. G. Timko, R. A. Cirelli, G. Dabbagh, R. S. Hutton, A. E. Novembre, B. W. Smith, J. Vac. Sci. Technol. B, 15 (6), 1 (1997).
  69. "Synthesis of Cyclooelfin-Maleic Anhydride Alternating Copolymers for 193 nm Imaging", F. M. Houlihan, T. I. Wallow, O. Nalamasu, E. Reichmanis, Macromolecules, 30, 6517 (1997).
  70. "The Design of Practical Chemically Amplified Resists for Deep-UV Lithography", E. Reichmanis, O. Nalamasu, "The Polymeric Materials Encyclopedia", J. C. Salamone, Editor, CRC Press, Vol. 2, 1170 (1996).
  71. "A Unified Approach to Resist Materials Design for the Advanced Lithographic Technologies", O. Nalamasu, E. Reichmanis, A. G. Timko, R. G. Tarascon, A. E. Novembre, Microelectronic Engineering, 27, 367 (1995).
  72. "Materials Design Considerations for Future Lithographic Technologies", E. Reichmanis, O. Nalamasu, A. E. Novembre, J. Photopolym. Sci. and Technol., 8(4), 709 (1995).
  73. "An Analysis of Process Issues with the Chemically Amplified Positive Resists", in Microelectronics Technology: Polymers in Advanced Imaging and Packaging, ACS Symposium Series 614, E. Reichmanis, C. K. Ober, S. A. MacDonald, T. Iwayanagi, T. Nishikubo, editors, ACS, Washington, DC, (1995), pp. 4-20.
  74. "Hydrogen Bonding in Sulfone- and N-Methylmaleimide-Containing Resist Polymers with Hydroxystyrene and Acetoxystyrene: Two-Dimensional NMR Studies", S. A. Heffner, M. E. Galvin, E. Reichmanis, L. Gerena, P. A. Mirau, ibid., pp. 166-179.
  75. "New Directions in the Design of Lithographic Resist Materials: A Case Study", E. Reichmanis, L. F. Thompson, Advances in Chemistry Series, Interrante, L. V. Ed., ACS, Washington, DC (1995), pp. 85-106.
  76. "Novel Photoresists Incorporating Trimethylsilyloxy-styrene", K. E. Uhrich, E. Reichmanis, S. A. Heffner, J. M. Kometani, O. Nalamasu, Chem. Mater., 6 , 287 (1994).
  77. "The Influence of Polymer Structure on the Miscibility of Photo-acid Generators", K. E. Uhrich, E. Reichmanis, F. A. Baiocchi, Chem. Mater., 6, 295 (1994).
  78. "Formation of Polymers Containing 4-Hydroxystyrene via Hydrolysis of 4-Trimethylsilyloxystyrene", K. E. Uhrich, E. Reichmanis, S. A. Heffner, J. M. Kometani, Macromolecules, 27 , 4936 (1994).
  79. "New Directions in the Design of Chemically Amplified Resists", E. Reichmanis, M. E. Galvin, K. E. Uhrich, P. A. Mirau, S. A. Heffner, Polymers for Microelectronics: Science and Technology", ACS Symposium Series 579, H. Ito, S. Tagawa, Editors, ACS, Washington, DC, (1994), pp. 52-69.
  80. "Chemically Amplified Resists: Chemistry and Processes", E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, Advanced Materials for Optics and Electronics, 4, 83 (1994).
  81. "Lithographic Resist Materials Chemistry", E. Reichmanis and A. E. Novembre, Ann. Rev. Mat. Sci., 23, 11-43 (1993).
  82. "A Novel Approach to Inducting Aqueous Base Solubility in Substituted Styrene-Sulfone Polymers", J. M. Kometani, M. E. Galvin, S. A. Heffner, F. M. Houlihan, O. Nalamasu, E. Chin and E. Reichmanis, Macromolecules, 26, 2165 (1993).
  83. "Radiation Effects on Polymer Materials: A Brief Overview", E. Reichmanis, C. W. Frank, J. H. O'Donnell and D. J. T. Hill, In "Irradiation of Polymeric Materials: Processes, Mechanisms and Applications", ACS Symposium Series 527, E. Reichmanis, C. W. Frank, J. H. O'Donnell, Eds., ACS, Washington, DC (1993) p.1.
  84. "X-ray and Deep-UV Radiation Response of t-BOC Protected 4-Hydroxystyrene-Sulfone Co-polymers", A. E. Novembre, J. E. Hanson, J. M. Kometani, W. W. Tai, E. Reichmanis, ibid., p. 179.
  85. "Chemical Amplification Mechanisms for Microlithography", E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, In "Polymers for Microelectronics; Resists and Dielectrics", ACS Symposium Series 537, Thompson, L. F., Willson, C. G, Tagawa, S., Eds., ACS, Washington, DC (1993) pp. 2-24.
  86. "The Radiation Induced Chemistry of Poly(4-tert-butoxycarbonyloxystyrene-co-sulfur dioxide)", E. Novembre, W. W. Tai, J. M. Kometani, J. E. Hanson, O. Nalamasu, G. N. Taylor, E. Reichmanis and L. F. Thompson, Chem. Mater., 4, 278 (1992).
  87. "Lithographic Properties of Single and Multi-Component Chemically Amplified Resists Based on Copolymers of 4-tert-Butoxycarbonyloxystyrene (TBS) and Sulfur Dioxide (SO2)", A. E. Novembre, J. E. Hanson, J. M. Kometani, W. W. Tai, O. Nalamasu, G. N. Taylor, E. Reichmanis, L. F. Thompson and D. Tomes, Microlectronic Engineering, 17(1-4), 257-261 (1992).
  88. "The Synthesis and Evaluation of Copolymers of t-Butoxycarbonyloxystyrene and 2-Nitrobenzylstyrene Sulfonates: Single Component Chemically Amplified Deep-UV Imaging Materials", J. E. Hanson, E. Reichmanis, F. M. Houlihan, T. X. Neenan, Chem. Mater., 4, 837 (1992).
  89. "Chemistry of Polymers for Microlithographic Applications", E. Reichmanis, in Polymers for Electronic and Photonic Applications, C. P. Wong, Editor, Academic Press, Boston, (1992).
  90. "Characteristics of An Improved Chemically Amplified Deep-UV Positive Resist", O. Nalamasu, J. M. Kometani, M. Cheng, A. G. Timko, and E. Reichmanis, J. Vac. Sci. Technol., B10, 2563 (1992).
  91. "Arylmethyl Sulfones: A New Class of Photoacid Generators", A. E. Novembre, J. E. Hanson, J. M. Kometani, W. W. Tai, E. Reichmanis and L. F. Thompson, Polym. Eng. and Sci., 32(20), 1476 (1992).
  92. "Effects of Post Exposure Delay in Positive Chemically Amplified Resists: An Analytical Study", O. Nalamasu, E. Reichmanis, J. E. Hanson, R. S. Kanga, L. A. Heimbrook, A. B. Emerson, F. A. Baiocchi and S. Vaidya, Polym. Eng. and Sci., 32(21), 1565 (1992).
  93. "Chemically Amplified Resists for Deep-UV Lithography: A New Processing Paradigm", E. Reichmanis, L. F. Thompson, O. Nalamasu, A. Blakeney and S. Slater", Microlithography World, 1(5), 7, (1992).
  94. "Chemical Amplification Mechanisms for Microlithography", E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, Chem. Mater., 3, 394 (1991).
  95. "The Design, Synthesis, Characterization and Use of All Organic, Non-Ionic Photogenerators of Acid", F. M. Houlihan, T. X. Neenan, E. Reichmanis, J. M. Kometani, T. Chin, Chem. Mater., 3, 462 (1991).
  96. "Chemistry and Processes for Deep-UV Resists", E. Reichmanis and L. F. Thompson, Microelectronic Engineering, 13, 3 (1991).
  97. "Chemistry and Processes for Deep-UV Resists", E. Reichmanis and L. F. Thompson, Microlectronic Engineering, 14, 215 (1991).
  98. "Synthesis and Characterization of Poly (4-t-butoxycarbonyloxystyrene-sulfone)," R. S. Kanga, J. M. Kometani, E. Reichmanis, J. E. Hanson, O. Nalamasu, L. F. Thompson, S. A. Heffner, W. W. Tai, P. Trevor, Chem. Mater., 3, 660 (1991).
  99. "An Overview of Resist Processing for Deep-UV Lithography", O. Nalamasu, M. Cheng, A. G. Timko, V. Pol, E. Reichmanis and L. F. Thompson, J. Photopolymer Sci. and Technol., 4(3), 229 (1991).
  100. "The Synthesis Characterization and Lithographic Behavior of Acid Photogenerating Systems Based Upon 2-Nitrobenzyl Ester Derivatives", T. X. Neenan, F. M. Houlihan, E. Chin, E. Reichmanis and J. M. Kometani, J. Photopolymer Sci. and Technol., 4(3), 341 (1991).
  101. "PTBSS: A High Resolution Single Component Aqueous Base Soluble Chemically Amplified Resist", A. E. Novmebre, W. W. Tai, J. M. Kometani, J. E. Hanson, O. Nalamasu, G. N. Taylor, E. Reichmanis and L. F. Thompson, J. Vac. Sci. Technol. B., 9(6), 3338 (1991).
  102. "Process Characteristics of An All-Organic Chemically Amplified Deep-UV Resist", M. Cheng, O. Nalamasu, A. G. Timko, V. Pol, J. M. Kometani, E. Reichmanis and L. F. Thompson, J. Vac. Sci. Technol. B., 9(6), 3374 (1991).
  103. "The Photo and Thermochemistry of Select 2,6-Dinitrobenzyl Esters in Polymer Matrices: Studies Pertaining to Chemical Amplification and Imaging", T.X. Neenan, F. M. Houlihan, E. Reichmanis, J. M. Kometani, B. J. Bachman, L. F. Thompson, Macromolecules, 145 (1990).
  104. "Organosilicon Polymers for Microlithographic Applications", E. Reichmanis, A. E. Novembre, R. G. Tarascon, A. Shugard and L. F. Thompson, In "Silicon-Based Polymer Science: A Comprehensive Resource", ACS Advances in Chemistry Series 224, American Chemical Society, Washington, DC, 1990, p.265.
  105. "Chemically Amplified Resists: The Chemistry and Lithographic Characteristics of Nitrobenzyl Benzenesulfonate Derivatives", F. M. Houlihan, T. X. Neenan, E. Reichmanis, J. M. Kometani, L. F. Thompson, T. Chin, O. Nalamasu, J. Photopolymer Sci. and Technol., 3(3), 259 (1990).
  106. "Chemistry and Processes for Deep-UV Lithography: Materials for Chemically Amplified Resists", E. Reichmanis, L. F. Thompson, F. M. Houlihan, T. X. Neenan, J. M. Kometani, R. S. Kanga, O. Nalamasu, Polymers for Microelectronics - Science and Technology, Kodansha, Tokyo, 1990, p 387.
  107. "Synthesis and Lithographic Characterization of Poly(4-t-butoxycarbonyloxystyrene-sulfone)", J. M. Kometani, O. Nalamasu, E. Reichmanis, R. S. Kanga, L. F. Thompson, S. A. Heffner, J. Vac. Sci. Technol. B, 8 (6), 1428 (1990).
  108. "Characterization of Novel Sulfonic Acid Photogenerating 2-Nitrobenzyl Ester Derivatives", F. M. Houlihan, T. X. Neenan, E. Reichmanis, J. M. Kometani, L. F. Thompson, T. Chin, R. S. Kanga, J. Vac. Sci. Technol B, 8 (6), 1461 (1990).
  109. "Challenges in Lithographic Materials and Processes", E. Reichmanis and L. F. Thompson, AT&T Technical Journal, 69 (6), 32 (1990).
  110. "Radiation Chemistry of Polymers for Electronic Applications", E. Reichmanis, In "The Effects of Radiation on High-Technology Polymers," E. Reichmanis and J. H. O'Donnell, Eds., ACS Symposium Series 381, American Chemical Society, Washington, DC, 1989, p 132.
  111. "Chemistry of Microelectronic Polymers", E. Reichmanis and C. W. Wilkins, Jr., In "Microelectronic Polymers," M. S. Htoo, ed. Marrel Dekker, Inc., New York, 1989, p 1.
  112. "Synthesis and Oxygen Reactive Ion Etching of Novolac-Siloxane Block Copolymers", M. J. Jurek, R. G. Tarascon and E. Reichmanis, Chem. Mater., 1, 319 (1989).
  113. "Poly (t-BOC-styrene-sulfone) Based Chemically Amplified Resists for Deep-UV Lithography", R. G. Tarascon, E. Reichmanis, F. M. Houlihan, A. Shugard, and L. F. Thompson, Polym. Eng. and Sci., 29 (13), 850 (1989).
  114. "Bilevel Lithographic Process Using the Deep-UV, Electron-beam Resist P(SI-CMS)", A. E. Novembre, M. J. Jurek, A. Kornblit, E. Reichmanis, Polym. Eng. and Sci., 29 (14), 920 (1989).
  115. "GC/MS Study of the Thermolysis and Acidolysis of Poly (t-BOC-±-methylstyrene) Poly (t-BOC styrene) and Poly (t-BOC styrene sulfone)", F. M. Houlihan, E. Reichmanis, R. G. Tarascon, G. N. Taylor, M. Y. Hellman and L. F. Thompson, Macromolecules, 22 (7), 2999 (1989).
  116. "Deep UV Lithographic Response and Quantum Efficiency Calculations of Poly(Trimethyl- silylmethyl Methacrylate-Chloromethylstyrene) Copolymers", M. J. Jurek, A. E. Novembre, I. P. Heyward, R. Gooden and E. Reichmanis, Chem. Mater., 1, 509 (1989).
  117. "Polymer Materials for Microlithography", E. Reichmanis and L. F. Thompson, Chemical Reviews, 89, 1273 (1989).
  118. "Polymers in Microlithography: An Overview", E. Reichmanis and L. F. Thompson, In "Polymers in Microlithography", ACS Symposium Series 412, American Chemical Society, Washington, DC, 1989, p 1.
  119. "Chemically Amplified Resists: Effect of Polymer and Acid Generator Strucutre", F. M. Houlihan, E. Reichmanis, L. F. Thompson, R. G. Tarascon, In "Polymers in Microlithography," ACS Symposium Series 412, American Chemical Society, Washington, DC, 1989, p 39.
  120. "Lithographic Evaluation of Novolac-Dimethyl Siloxane Block Copolymers", M. J. Jurek and E. Reichmanis, In "Polymers in Microlithography," ACS Symposium Series 412, American Chemical Society, Washington, DC, 1989, p 158.
  121. "Nitrobenzyl Ester Chemistry for Polymer Processes Involving Chemical Amplification", F. M. Houlihan, A. Shugard, R. Gooden and E. Reichmanis, Macromolecules, 21, 2001 (1988).
  122. "Experimental Tests of the Steady-State Model for Oxygen Reactive Ion etching of Silicon-Containing Polymers", C. W. Jurgensen, A. Shugard, N. Dudash, E. Reichmanis and M. J. Vasile, J. Vac. Sci. Technol. A, 6 (5), 2938 (1988).
  123. "P(SI-MA)/2-Nitrobenzyl Cholate: A Two-Level Solution-Inhibition Deep-UV Resist System", E. Reichmanis, B. C. Smith, G. Smolinsky and C. W. Wilkins, Jr., J. Electrochem. Soc., 134(3), (1987).
  124. "Polymer Materials for Microlithography", E. Reichmanis and L. F. Thompson, Annual Review of Materials Science, 17, 235-271 (1987).
  125. "New Silicon-Containing Electron-Beam Resist Systems", E. Reichmanis, A. E. Novembre, R. G. Tarascon and A. Shugard in "Polymers for High Technology;" M. J. Bowden and S. Turner, Eds, ACS Symposium Series, 346, 110 (1987).
  126. "An Organosilicon Novolac Resin for Multilevel Resist Applications", C. W. Wilkins, Jr., E. Reichmanis, T. M. Wolf and B. C. Smith, J. Vac. Sci. Technol., B 3(1), 306-309 (1985).
  127. "o-Nitrobenzyl Photochemistry: Solution vs. Solid-State Behavior", E. Reichmanis, B. C. Smith and R. Gooden, J. Poly. Sci., Poly. Chem. Ed., 23, 1-8 (1985).
  128. "Oxygen RIE Resistant Deep-UV Positive Resists: Poly(trimethyl-silylethyl methacrylate) and Poly(trimethylsilylmethyl methacrylate-co-3-oximino-2-butanone methacrylate) ", E. Reichmanis and G. Smolinsky, J. Electrochem. Soc., 132(5), 1178-1182 (1985).
  129. "Approaches to Resists for Use in Two-Level, RIE, Pattern-Transfer Applications", E. Reichmanis, G. Smolinsky and C. W. Wilkins, Jr., Solid State Technol., 28(8), (1985).
  130. "A Study of the Photochemical Response of o-Nitrobenzyl Cholate Derivatives in P(MMA-MAA) Matrices", E. Reichmanis, R. Gooden, C. W. Wilkins, Jr. and H. Schonhorn, J. Poly. Sci., Poly. Chem. Ed. 21, 1075-1083 (1983).
  131. "New Photoresists for Deep-Ultraviolet (<300nm) Exposure", E. A. Chandross, E. Reichmanis, C. W. Wilkins, Jr. and R. L. Hartless, Can. J. Chem., 61(5), 817-823 (1983).
  132. "Deep-UV Photolithographic Systems and Processes", C. W. Wilkins, Jr., E. Reichmanis, E. A. Chandross and R. L. Hartless, Poly. Eng. and Sci., 23(18) , 1025-1028 (1983).
  133. "Materials for Multilevel Resist Schemes", E. Reichmanis, C. W. Wilkins, Jr. and E. Ong, Poly. Engin. and Sci., 23(18), 1039-1042 (1983).
  134. "The Effect of Substituents on the Photosensitivity of 2-Nitrobenzyl Ester Deep-UV Resists", E. Reichmanis, C. W. Wilkins, Jr., D. A. Price and E. A. Chandross, J. Electrochem. Soc., 130(6), 1433-1437 (1983).
  135. "Radiation Degradation of Copolymers of Methyl Methacrylate and 3-Oximino-2-butanone Methacrylate", T. N. Bowmer, E. Reichmanis, C. W. Wilkins, Jr. and M. Y. Hellman, J. Poly. Sci. Chem. Ed., 20 , 2661-2668 (1982).
  136. "Poly(methyl methacrylate-co-3-oximino-2-butanone methacrylate-co-methacrylonitrile): A Deep-UV Photoresist", E. Reichmanis and C. W. Wilkins, Jr., ACS Symposium Series, No. 184, Polymer Materials for Electronic Applications, E. D. Feit, C. W. Wilkins, Jr., Eds, 29-43 (1982).
  137. "Compositional Analysis of a Terpolymer Photoresist by Raman Spectroscopy", F. J. Purcell, E. Russavage, E. Reichmanis and C. W. Wilkins, Jr., ibid. 45-59.
  138. "Lithographic Evaluation of an o-Nitrobenzyl Ester-Based Deep-UV Resist System", C. W. Wilkins, Jr., E. Reichmanis and E. A. Chandross, J. Electrochem. Soc., 129(11), 2552-2555 (1982).
  139. "A Novel Approach to o-Nitrobenzyl Photochemistry for Resists", E. Reichmanis, C. W. Wilkins, Jr. and E. A. Chandross, J. Vac. Sci. Technol., 19(4), 1338-1342 (1981).
  140. "Photoresists for Deep-UV Lithography", E. A. Chandross, E. Reichmanis, C. W. Wilkins, Jr. and R. L. Hartless, Solid State Technology, 24(8), 81-85 (1981).
  141. "The Effect of Sensitizers on the Photodegradation of Poly(methyl methacrylate-co-3-oximino-2-butanone methacrylate)", E. Reichmanis, C. W. Wilkins, Jr. and E. A. Chandross, J. Electrochem. Soc., 127 (11), 2514-2517 (1980).
  142. "Preliminary Evaluation of Copolymers of Methyl Methacrylate and Acyloximino Methacrylate as Deep-UV Resists", C. W. Wilkins, Jr., E. Reichmanis and E. A. Chandross, J. Electrochem. Soc., 127(11) , 2510-2513 (1980).
  143. "The Development of Aromaticity in the l-Pyrindine System; A Surprising Insensitivity to N-Substitution", A. G. Anastassiou, E. Reichmanis and S. J. Girgenti, J. Amer Chem. Soc., 100 (1978).
  144. "1,2and l,4 Oxides of Azonine. A Unique Synthetic Entry into N-Substituted l-Pyrindines", A. G. Anastassiou, S. J. Girgenti, R. C. Griffith and E. Reichmanis, J. Org. Chem., 42, (1977).
  145. "Pericyclic Synthesis and Exploratory Photochemistry of Potentially Direct Progenitors of the Unrestricted Hetero[11] Annulene System", A. G. Anastassiou, E. Reichmanis, S. J. Girgenti and M. Schaefer-Ridder, J. Org. Chem., 42, (1977).
  146. "Cycloadditive Coupling Between 3,6-Diphenyl-s-tetrazine and Selected Biocyclo[6.1.0]nona-2,4,6-trienes; Pericyclic Synthesis of Pyridazinocyclononatetraene and Pyridazinoazonine Frames", A. G. Anastassiou and E. Reichmanis, J.C.S. Chem. Commun., 3.3 (1976).
  147. "9H-Azabarbaralane; A ??Destabilized Heterolongicycle", A. G. Anastassiou, E. Reichmanis and A. E. Winston, Angew. Chem. Internat. Edit., 15, 370 (1976).
  148. "An Examination of the Heteronins by Carbon-13 Nuclear Magnetic Resonance", A. G. Anastassiou and E. Reichmanis, J. Amer. Chem. Soc., 98, 8266 (1976).
  149. "An Examination of the 9-Heterobicyclo[4.2.1]nona-2,4,7-trienes by Carbon-13 Nuclear Magnetic Resonance", A. G. Anastassiou and E. Reichmanis, J. Amer. Chem. Soc., 98 , 8267 (1976).
  150. "A Stable trans-Benzazoninyl Anion", A. G. Anastassiou and E. Reichmanis, J.C.S. Chem. Commun., 149 (1975).
  151. "The Fuctional Behavior of 9-Heterbarbaralanes", A. G. Anastassiou, E. Reichmanis and J. C. Wetzel, Tetrahedron Letters, 1651 (1975).
  152. "3H-3-Benzazonine and the 3-Benzazoninyl Anion", A. G. Anastassiou and E. Reichmanis, Angew. Chem., 86, 410 (1974) and Agnew. Chem. Internat. Edit., 13, 404 (1974).
  153. "trans-Benzocyclononatetraenyl Anion", A. G. Anastassiou and E. Reichmanis, Angew. Chem., 86 (1974) and Agnew. Chem. Internat. Edit., 13, 728 (1974).
  154. "Effect of Heteratom Electronegativity on the Development of Diatropic Character in cis,trans,cis,trans-Aza[13] annulene", A. G. Anastassiou, R. L. Elliott and E. Reichmanis, J. Am. Chem. Soc., 96, 7823 (1974).
  155. "Dioxa and Trioxa Derivatives of C8H8", A. G. Anastassiou and E. Reichmanis, J. Org. Chem., 38, 2421 (1973).
  156. "The 4,5-Benzazonine System", A. G. Anastassiou, E. Reichmanis and R. L. Elliott, Tetrahedron Letters, 3805 (1973).
  157. "The 9-Azabarbaralane(9-Azatricyclo[3.3.1.02,8] nona-3,6-diene) Systems", A. G. Anastassiou, A. E. Winston and E. Reichmanis, J.C.S. Chem. Commun., 779 (1973).
  158. "(7-Cycloheptatrienyl)-cis4-1,3,5,7,-cyclononatetraene", A. G. Anastassiou, E. Reichmanis and R. C. Griffith, J.C.S. Chem. Commun., 913 (1972).

Other Publications

  1. "Fully Mass Printed Integrated Circuits", F. Doetz, E. Reichmanis, H. E. Katz, et al, MRS Proceedings, December, 2005.
  2. "Tunable Bio-Inspired Microlens Arrays in Environmentally Responsive Hydrogels", S. Yang, J. Aizenberg, Y.-J. Han, G. Chen, R. Rapaport, E. Reichmanis, C. Ullal, E. K. Thomas, 2003 MRS Fall Procedings, Symposium M: Nontraditional Approaches to Patterning
  3. "Materials Challenges and Alternatives for Advanced Photolithographic Patterning: From 193 to 157 nm and Beyond", E. Reichmanis, O. Nalamasu, F. M. Houlihan, Proceedings, Materials Research Society, 636, D5.2.1-D5.2.12 (2001).
  4. "Study of Base Additives for Use in a Single Layer 193 nm Resist Based Upon Poly(norbornene/maleic anhydride/acrylic acid/tert-butyl Acrylate) ", F. M. Houlihan, D. Person, O. Nalamasu, O. Dimov, E. Reichmanis, Proc. SPIE, 4345, 67-77 (2001).
  5. "Lithographic Behavior of Carboxylate Based Dissolution Inhibitors and the Effect of Blending", F. M. Houlihan, Z. Yan, E. Reichmanis, G. Dabbagh, K. Bolan, O. Nalamasu, I?Rushkin, O. Dimov, Proc. SPIE, 4345, 703-711 (2001).
  6. "Polymers for Microlithographic Applications: New Directions and Challenges", E. Reichmanis, O. Nalamasu, F. M. Houlihan, Macromolecular Symposia, (2000).
  7. "Lithographic Materials Technologies: 193 nm Imaging and Beyond", E. Reichmanis, O. Nalamasu, F. M. Houlihan, A. H. Gabor, M. O. Neisser, M. J. Bowden, MRS Proc., 584, 23 (2000).
  8. "Study of Dissolution Properties of Cycloolefin-Maleic Anhydride Based Resist Systems", I. L. Ruskhin, F. M. Houlihan, J. M. Kometani, R. S. Hutton, O. Nalamasu, E. Reichmanis, et al., Proc. SPIE, 3999, 214 (2000).
  9. "A Model Study by FT-IR and 13C NMR the Interaction of Poly(Norbornene-alt-Maleic Anhydride) and its Derivatives With Select Cholate Dissolution Inhibitors or with Select Iodonium and Sulfonium Photo-Acid Generators", G. Dabbagh, F. M. Houlihan, I. Rushkin, R. S. Hutton, O. Nalamasu, E. Reichmanis, Z. Yan, A. Reiser, Proc. SPIE, 3999, 127 (2000).
  10. "Mechanism of a Single-Layer 193 nm Dissolution Inhibition Result", Z. Yan, F. M. Houlihan, E. Reichmanis, O. Nalamasu, A. Reiser, G. Dabbagh, R. S. Hutton, D. Osei, J. Sousa, K. J. Bolan, Proc. SPIE, 3999, 127 (2000).
  11. "A Study of Resist Outgassing as a Function of Differing Photoadditives", F. M. Houlihan, I. L. Rushkin, R. S. Hutton, A. G. Timko, O. Nalamasu, E. Reichmanis, A. H. Gabor, A. N. Medina, S. Malik, M. Neisser, R. R. Kunz, D. K. Downs, Proc. SPIE, 3678, 264 (1999).
  12. "Model Study by FT-IR of the Interaction of Select Cholate Dissolution Inhibitors with Poly(norbornene-alt-maleic anhydride) and its Derivatives", G. Dabbagh, F. M. Houihan, I. L. Rushkin, R. S. Hutton, E. Reichmanis, O. Nalamasu, A. H. Gabor, A. N. Medina, Proc. SPIE, 3678, 86 (1999).
  13. "New Polymers for 193 nm Single-Layer Resist Based on Substituted Cycloolefins/Maleic Anhydride Resins", I. L. Rushkin, F. M. Houlihan, J. M. Kometani, R. S. Hutton, A. G. Timko, E. Reichmanis, O. Nalamasu, A. H. Gabor, A. N. Medina, S. G. Slater, Proc. SPIE, 3678, 44 (1999).
  14. "Optimization of 193 nm Single-Layer Resists Through Statistical Design", A. H. Gabor, O. Dimov, A. N. Medina, M. O. Neisser, S. G. Slater, R. H. Wang, F. M. Houlihan, R. A. Cirelli, G. Dabbagh, R. S. Hutton, I. L. Rushkin, J. R. Sweeney, A. G. Timko, O. Nalamasu, E. Reichmanis, Proc. SPIE, 3678, 221 (1999).
  15. ?oward the Ultimate Storage Device: The Fabrication of an Ultra-High Density Memory Device with 193 nm Lithography," R. A. Cirelli, E. Reichmanis, O. Nalamasu, et al., Proc. SPIE, 3678, 295 (1999).
  16. "193 nm Single Layer Photoresists Based on Alternating Copolymers of Cycloolefins: The Use of Photogenerators of Sulfamic Acids", F. M. Houlihan, J. M. Kometani, A. G. Timko, R. S. Hutton, R. A. Cirelli, E. Reichmanis, O. Nalamasu, A. H. Gabor, A. N. Medina, J. J. Biafore, S. G. Slater, Proc. SPIE, 3333, 73 (1998).
  17. "Recent Advances in Increasing the Thermal Flow Resistance of Acetal Derivatized Polyhydroxystyrene Deep-UV Matrix Resins", J. M. Kometani, F. M. Houlihan, A. G. Timko, O. Nalamasu, E. Reichmanis, S. A. Heffner, M. E. Galvin, Proc. SPIE, 3333, 672 (1998).
  18. "Positive Tone Processing of Plasma Polymerized Methylsilane (PPMS)", G. Dabbagh, R. S. Hutton, R. A. Cirelli, E. Reichmanis, A. E. Novembre, O. Nalamasu, Proc. SPIE, 3333, 394 (1998).
  19. "Recent Advances in 193 nm Single-Layer Photoresists Based on Alternating Copolymers of Cycloolefins", F. M. Houlihan, T. I. Wallow, A. G. Timko, E. Neria, R. S. Hutton, R. A. Cirelli, O. Nalamasu, E. Reichmanis, Proc. SPIE, 3049, 84 (1997).
  20. "An Overview of Photoacid Generator Design for Acetal Resist Systems", F. M. Houlihan, O. Nalamasu, E. Reichmanis, et al., Proc. SPIE, 3049, 466 (1997).
  21. "Evaluation of Cycloolefin-Maleic Anhydride Alternating Copolymers as Single-Layer Photoresists for 193 Photolithography", T. I. Wallow, F. M. Houlihan, O. Nalamasu, E. A. Chandross, T. X. Neenan, E. Reichmanis, Proc. SPIE, 2724, 355 (1996).
  22. "Advanced Positive Photoresist for Practical Deep-UV Lithography", O. Nalamasu, A. G. Timko, E. Reichmanis, J. M. Kometani, D. R. Stone, T. X. Neenan, E. A. Chandross, Proc. SPIE, 2195, 47 (1994).
  23. "Preliminary Lithographic Characteristics of an All Organic Chemically Amplified Resist Formulation for Single Layer Deep-UV Lithography", O. Nalamasu, E. Reichmanis, M. Cheng, V. Pol, J. M. Kometani, F. M. Houlihan, T. X. Neenan, M. P. Bohrer, D. A. Mixon, L. F. Thompson, C. H. Takemoto, Proc. SPIE, 1466, 13 (1991).
  24. "Single Component Chemically Amplified Resist Materials for Electron-beam and X-ray Lithography", A. E. Novembre, W. W. Tai, J. M. Kometani, J. E. Hanson, O. Nalamasu, G. N. Taylor, E. Reichmanis, L. F. Thompson, Proc. SPIE, 1466, 89 (1991).
  25. "Development of a Chemically Amplified Positive Resist Material (CAMP) for Single Layer Deep-UV Lithography", O. Nalamasu, M. Cheng, J. M. Kometani, S. Vaidya, E. Reichmanis and L. F. Thompson, Proc. SPIE, "Advances in Resist Technology and Processing VII," 1262, 32 (1990).
  26. "Investigation of the Exposure and Bake of a Positive Acting Resist with Chemical Amplification", R. A. Ferguson, C. A. Spence, E. Reichmanis, L. F. Thompson A. R. Neureuther, Proc. SPIE, "Advances in Resist Technology and Processing VII," 1262, 412 (1990).
  27. "Chemically Amplified Resists: A Lithographic Comparison of Acid Generating Species", T. X. Neenan, F. M. Houlihan, E. Reichmanis, Proc. SPIE, "Advances in Resist Technology and Processing VI," 1086 , 2 (1989).
  28. "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists", F. M. Houlihan, A. Shugard, R. Gooden and E. Reichmanis, Proc. SPIE, "Advances in Resist Technology and Processing V," 920, 67 (1988).
  29. "Experimental Tests of the Steady-State Model for Oxygen Reactive Ion Etching of Silicon-Containing Polymers", C. W. Jurgensen, A. Shugard, N. Dudash, E. Reichmanis and M. J. Vasile, Proc. SPIE, "Advances in Resist Technology and Processing V," 920, 253 (1988).
  30. "Chemical Factors Affecting NPR Performance", R. G. Tarascon, J. Frackoviak, E. Reichmanis and L. F. Thompson, Proc. SPIE, "Advances in Resist Technology and Processing IV," 771, 54 (1987).
  31. "Process Parameters for Sub-micron Electron-beam Lithography of NPR", J. Frackoviak, R. G. Tarascon, S. Vaidya and E. Reichmanis, Proc. SPIE, "Advances in Resist Technology and Processing IV," 771, 120 (1987).
  32. "Preparation and Lithographic Properties of Poly(Trimethylsilyl-methyl Methacrylate-co-Chloromethyl Styrene) ", A. E. Novembre, E. Reichmanis and M. Davis, Proc. SPIE, Advances in Resist Technology and Processing III, 631, 14-21 (1986).
  33. "Synthesis and Lithographic Characterization of a Novel Organosilicon Novolac Resin", R. G. Tarascon, A. Shugard and E. Reichmanis, Proc. SPIE, Advances in Resist Technology and Processing III, 631, 40-46 (1986).
  34. "Deep-UV Positive Resists for Two-Level Photoresist Processes", E. Reichmanis and G. Smolinsky, Proc. SPIE, Vol. 469, Advances in Resist Technology, 38-44 (March, 1984).
  35. "Deep-UV Photoresists: A Novel Application of o-Nitrobenzyl Photochemistry", E. Reichmanis, C. W. Wilkins, Jr. and E. A. Chandross, Microcircuit Engineering Proceedings, Lausanne, 418-426 (1981).
  36. "Bilevel Resist Processing Techniques for Fine Line Lithography", E. Ong, K. Tai, E. Reichmanis and C. W. Wilkins, Jr., Proceedings, Kodak Microelectronics Seminar, 91-97 (Oct. 1981).

Books

  1. "The Effects of Radiation on High Technology Polymers," E. Reichmanis and J. H. O'Donnell, Eds, ACS Symposium Series 381, American Chemical Society, Washington, DC, 1989.
  2. "Polymers in Microlithography," E. Reichmanis, S. A. MacDonald and T. Iwayanagi, Eds, ACS Symposium Series 412, American Chemical Society, Washington, DC, 1989.
  3. "Irradiation of Polymeric Materials", E. Reichmanis, C. W. Frank, J. H. O'Donnell. Eds, ACS Symposium Series 527, American Chemical Society, Washington, DC, 1993.
  4. "Microelectronics Technology: Polymers in Advanced Imaging and Packaging", E. Reichmanis, C. K. Ober, S. A. MacDonald, T. Iwayanagi, T. Nishikubo, Eds, ACS Symposium Series 614, American Chemical Society, Washington, DC, 1995.
  5. "Micro and Nano-Patterning Science & Technology", E. Reichmanis, O. Nalamasu, H. Ito, T. Ueno, Eds., ACS Symposium Series 706, American Chemical Society, Washington, DC, 1998.

Patents

  1. Liquid Phase Fabrication of Active Devices Including Organic Semiconductors, F. dotz, H. E. Katz, J. Granstrom, E. Reichmanis, S. Vaidyanathan, I. Hennig, F. Richter, US patent 7569415, issued August 4, 2009
  2. Organic Semiconductors, F. Dotz, H. E. Katz, E. Reichmanis, S. Vaiyanathan, I. Hennig, US Patent 7488834, issued February 10, 2009
  3. Organic Semiconductor having Polymeric and Nonpolymeric Constituents, E. Reichmanis, O. Sydorenko, S. Vaidyanathan, US Patent 7309876, issued December 18, 2007
  4. "Process for making crystalline structures having interconnected pores and high refractive index contrasts", Gang Chen, Ronen Rapaport, Elsa Reichmanis, Shu Yang, U.S. Patent Number: 7,168,266, issued January 30, 2007
  5. Patterned structures of high refractive index materials, E. Reichmanis S. Yang, US patent 7008757, issued March 7, 2006
  6. Semiconductor device having a low dielectric constant dielectric material and process for its manufacture, O. Nalamasu, C.-S. Pai, E. Reichmanis, S. Yang, US Patent 6852648, issued February 8, 2005
  7. Method and Apparatus for Aligning a Photo-microtunable Microlens, Z. Bao, T. N. Kroupenkine, A. M. Lyons, M. L. Mandich, L. T. Manzione, E. Reichmanis, S. Yang, US Patent No. 6665127, December 16, 2003
  8. Energy-Sensitive Resist Material and a Process for Device Fabrication Using an Energy-Sensitive Resist Material, E. A. Chandross, F. M. Houlihan, O. Nalamasu, E. Reichmanis, T. I. Wallow, U.S. Patent No. 5,879,857, March 9, 1999.
  9. Energy-Sensitive Resist Material and a Process for Device Fabrication Using an Energy-Sensitive Resist Material,F. M. Houlihan, O. Nalamasu, E. Reichmanis, T. I. Wallow, U.S. Patent No. 5,843,624, December 1, 1998.
  10. Resist Materials and Related Processes, E. A. Chandross, J. M. Kometani, O. Nalamasu, E. Reichmanis, K. E. Uhrich, U.S. Patent No. 5,741,629, April 21, 1998.
  11. Process for Manufacturing Devices Using Maleimide Containing Resist Polymers, M. E. Galvin, E. Reichmanis, M. E. Galvin-Donoghue, E. Reichmanis, U.S. Patent No. 5,756,266, May 26, 1998.
  12. Process for Fabricating a Device, E. A. Chandross, O. Nalamasu, E. Reichmanis, G. N. Taylor, U.S. Patent No. 5,750,312, May 12, 1998.
  13. Resist Materials, U.S. Patent 5,200,544, F. M. Houlihan, T. X. Neenan, E. Reichmanis, April 6, 1993.
  14. Resist Materials, U.S. Patent 5,135,838, F. M. Houlihan, T. X. Neenan, E. Reichmanis, August 4, 1992.
  15. Radiation Sensitive Materials and Devices Made Therewith, U.S. Patent 4,996,136, F. M. Houlihan, E. Reichmanis, L. F. Thompson, February 26, 1991.
  16. Fabrication of Electronic Devices Utilizing Lithographic Techniques, U.S. Patent 4,701,342, A. E. Novembre and E. Reichmanis, October 20, 1987.
  17. Process for Preparing Semiconductors Using Photosensitive Bodies, U.S. Patent 4,551,416, E. A. Chandross, E. Reichmanis and C. W. Wilkins, Jr., November 4, 1985.
  18. Bilevel Resist, U.S. Patent 4,521,274, E. Reichmanis and C. W. Wilkins, Jr., June 4, 1985.
  19. Bilevel Resist, U.S. Patent 4,481,049, E. Reichmanis and G. Smolinsky, November 6, 1984.
  20. Process of Making Semiconductor Devices using Photosensitive Bodies, U.S. Patent 4,400,461, E. A. Chandross, E. Reichmanis and C. W. Wilkins, Jr., September 23, 1983.
  21. Photosensitive Element Containing UV Sensitive Terpolymers, U.S.Patent 4,382,120, Reichmanis and C. W. Wilkins, Jr., May 3, 1983.
  22. Photosensitive Element Comprising a Substrate and an Alkaline Soluble Mixture, U.S. Patent 4,666,820, E. A. Chandross, E. Reichmanis, C. W. Wilkins, Jr.
  23. Multiple Exposure Microlithography Patterning Method, U.S.Patent 4,373,018, Reichmanis, B. J. Roman, K. L. Tai and C. W. Wilkins, Jr., February 8, 1983.
  24. Process of Exposing and Developing Terpolymer Photosensitive Bodies, U.S. Patent 4,343,889, E. Reichmanis and C. W. Wilkins, Jr., September 10, 1982.